MFD.........................2008.............2008...............2009
Actual Time...............9628.............7553..............2059
Exposure Time...........4495.............2886................750
Plate.....................298811..........251653............64297
LD U(hours).............11766.............4454..............2427
LD L(hours)........... ..11766............4454...............2427
GLV(hours).....................5...............746................750
Processor G&J 125HDX Elantrix 85 Elantrix 125
Full Refubish In Production
Location: All in Seoul, Korea, Republic of
Contact: JM Kim, jongmyung_kim Skype
[email protected]
More high speed Thermal CTP and UV CTP systems available.
Kodak Trendsetter IV, CRON 64ch, 96Ch, Amsky 64Ch, 96Ch, Basys, Lucsher etc
Actual Time...............9628.............7553..............2059
Exposure Time...........4495.............2886................750
Plate.....................298811..........251653............64297
LD U(hours).............11766.............4454..............2427
LD L(hours)........... ..11766............4454...............2427
GLV(hours).....................5...............746................750
Processor G&J 125HDX Elantrix 85 Elantrix 125
Full Refubish In Production
Location: All in Seoul, Korea, Republic of
Contact: JM Kim, jongmyung_kim Skype
[email protected]
More high speed Thermal CTP and UV CTP systems available.
Kodak Trendsetter IV, CRON 64ch, 96Ch, Amsky 64Ch, 96Ch, Basys, Lucsher etc